Simultaneous both side plasma processing type for large size PCB and other organic materials
| M120W | |
| Machine Dimension |
H: 2000mm |
| Weight | Appx. 1500kg |
| Power | 3 Phase 200V, 40kVA |
| Cooling water | Single system, difference between in/out over 0,1MPa, 15NL/min. |
| Compress air | 0,5 - 0,7 MPa 10NL/min. |
| Process gas | O2, Ar, CF4, N2, H2 |
| Other | Emmision duct |
| Process | Simultaneous both side scan, return system |
| Max. work size | Width 540mm x 640mm |
| Process side | Double side |
| Function |
Improve Wettability |
| Application | Mass production |
- Large area processing, max 540mm x 640mm
- Homogeneous processing to the work by the scanning process.
- Fine tune control by the original processing method and plasma condition control.
- 600m width reactor specialized for the wide range processing.
Steady scan system enables to make homogeneous process to the large area. Also, with the fine tune control it is adjustable to the nano size to micro size operation.